Silicon dioxide ≥99.995% (metals basis), sputtering target, Ø 76.2 mm (3.0 in), Thickness: 6.35 mm (0.250 in)

Supplier: Thermo Scientific

Synonyms: Silicon(IV) oxideSilicium (IV) oxideSilicium dioxide

41099.KSEA 660 EUR
41099.KS
Silicon dioxide ≥99.995% (metals basis), sputtering target, Ø 76.2 mm (3.0 in), Thickness: 6.35 mm (0.250 in)
Silicium dioxide
Formula: SiO₂
MW: 60.08 g/mol
Boiling Pt: 2230 °C (1013 hPa)
Melting Pt: 1719 °C
Density: 2.2 g/cm³ (20 °C)
Storage Temperature: Ambient
MDL Number: MFCD00011232
CAS Number: 7631-86-9
EINECS: 231-545-4
Merck Index: 14,08493

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